The global market: The global ALD equipment market size is expected to reach 6.8 billion US dollars in 2024, with a compound annual growth rate of 7.3% to 7.4% from 2025 to 2030. Among them, the integrated circuit field accounts for more than 70%......

ALD (Atomic Layer Deposition) technology is a thin film deposition method based on surface self-limiting chemical reactions. Its core principle is to alternately introduce two or more gaseous precursors into the reaction chamber, causing the reactants to chemically adsorb on the substrate surface and form a single-atom layer film. Precise thickness control (with an accuracy of up to 0.1nm) is achieved through cyclic deposition. This "self-limiting" ......