TaC Component -Shandong Yingchuang Nano Technology Co. LTD

TaC component

Home / TaC Component

TaC Component

—

CVD Process Advantages

Chemical Vapor Deposition (CVD) with Distinct Superiorities

Wide application range. It can prepare both coatings and crystals. By adjusting the flow rates of various gas raw materials, the composition of products can be controlled in a wide range. It is capable of preparing gradient films, multi-layer single-crystal films to meet coating application requirements, as well as high-quality crystals hardly obtainable by other methods.

Excellent performance of deposited films
1. Fast deposition rate, enabling batch production of coatings with uniform composition.
2. Conducted under normal pressure or low vacuum, featuring good throwing power.
3. The film growth temperature is far lower than the melting point of the film material. At low growth temperatures, reaction gases barely react with reactor walls and impurities inside, resulting in high-purity films with good crystallinity.
Outperforms alternative processes Compared with powder metallurgy, plasma spraying, PVD and other processes, which suffer from low material density, poor coating adhesion and low deposition efficiency, CVD delivers fine grains, controllable thickness, high bonding strength, and coatings resistant to peeling and cracking.

CVD Process Comparison

Comparison of Chemical Vapor Deposition (CVD) and Other Processes

Comparison Item	CVD Process	Powder Metallurgy Process	Plasma Spraying Process	PVD Process
Thin-wall, complex-shaped, large-size parts	Available	Not available	Limited preparation / Poor effect	Limited preparation / Poor effect (<10 μm)
Purity	High (>99.995)	Low (<99)	Low (<99)	Low (<99)
Crystal Structure	Controllable	Uncontrollable	Uncontrollable	Uncontrollable
Porosity	0%	5%-20%	5%-15%	5%-15%
Multi-alloy layer & Multi-layer film	Available	Not available	Not available	Not available

Comparison Item

Thin-wall, complex-shaped, large-size parts

CVD Process

Available

Powder Metallurgy Process

Not available

Plasma Spraying Process

Limited preparation / Poor effect

PVD Process

Limited preparation / Poor effect (<10 μm)

Comparison Item

Purity

CVD Process

High (>99.995)

Powder Metallurgy Process

Low (<99)

Plasma Spraying Process

Low (<99)

PVD Process

Low (<99)

Comparison Item

Crystal Structure

CVD Process

Controllable

Powder Metallurgy Process

Uncontrollable

Plasma Spraying Process

Uncontrollable

PVD Process

Uncontrollable

Comparison Item

Porosity

CVD Process

Powder Metallurgy Process

5%-20%

Plasma Spraying Process

5%-15%

PVD Process

5%-15%

Comparison Item

Multi-alloy layer & Multi-layer film

CVD Process

Available

Powder Metallurgy Process

Not available

Plasma Spraying Process

Not available

PVD Process

Not available

Process Advantages

Independent Intellectual Property Rights for Process Technology & Equipment, Underpinning High-Quality Production

Process Technology: ANGASTROME masters R&D technologies for large-scale CVD equipment and production lines, refractory metal CVD processes, as well as large-volume CVD processes. Relevant patents and trademarks have been filed, effectively filling the domestic technical gap in this field.
Equipment: The company has developed China’s first domestically made CVD equipment with precise control for refractory metals, featuring fully independent intellectual property rights.
Manufacturing Workflow: The company has built a full-process production line covering graphite material selection, purification, precision CNC machining, CVD deposition and inspection.
By closely integrating self-developed equipment with proprietary processes, the company takes the lead in realizing the industrialization of refractory metal CVD in China, establishing a high-quality production model.

Three Major Advantages of Our Company

—

Precise Control

- The yield rate of products in the same batch exceeds 95%.
- The performance difference between different batches is no more than 5%.
- The preparation cycle difference between different batches is no more than 5%.
- Product purity exceeds 99.9999% with consistent ideal crystal structure, ensuring

Advanced Reaction Process Design

- Low production cost and high deposition efficiency.
- The maintenance cycle and failure rate of the equipment support continuous industrial production, forming the foundation for industrialization.

Continuous and Stable Equipment Operation

Other similar domestic equipment has a high failure rate, requiring frequent maintenance and suffering from repeated process interruptions, which fails to guarantee continuous industrial production.

Product Application

—

Plant Equipment

—

