ABOUT US
● The Angstrom-dep ® atomic layer deposition (ALD) system was launched by Emmi Thin Film Technology Corporation of the United States.
●Among the company's technical staff are members of the National Academy of Engineering of the United States, researchers from US national laboratories, and committee members of the International Semiconductor Technology Development Map (ITRS) in the fields of plasma and thin films
● The company is one of the earliest in the world to introduce a commercial ALD system with powder ALD functionality. It has close cooperation with US national laboratories and many universities in the fields of using thermal ALD and plasma ALD for nanoparticle modification and performance regulation of nanopporous materials, and has won the R&D100 International Award in 2011 and 2015.
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WHY CHOOSE US ?
Rich product series
Technical team: Over 20 years of in-depth experience in high-end equipment mechanical design and process, with over 200 million US dollars of successful commercial landing experience
A full-stack enterprise of high-end equipment
Four major categories of films, namely ALD, CVD, PVD and EPI, have been completed
One-stop solution layout for sedimentary equipment
Quality service
Advanced solutions directly address the three major pain points in the industry: precision, stability, and efficiency
Global sales network
With over 100 global customer cases and successful experience in providing one-stop services from equipment production to delivery and use
Scientific Research
Many members of the team are employed by the world's top equipment companies.
It holds the world's top position in equipment research and development as well as the application of core technologies
Cutting-edge technology, with over 20 years of experience in thin film deposition processes and equipment
Have experience in development and marketization
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